Widodo, S. (2012). TEKNIK PELAPISAN SILIKON DIOKSIDA (SiO2) DENGAN ALAT RF-SPUTTERING ARC-12M. PROSIDING SEMINAR NASIONAL FISIKA (E-JOURNAL), 1(1), 82 - 88. Retrieved from https://journal.unj.ac.id/unj/index.php/prosidingsnf/article/view/6158