PENGARUH SUHU TUMBUH 450 C DAN 500 C PADA STRUKTUR KRISTAL LAPISAN TIPIS SENG OKSIDA
DOI:
https://doi.org/10.21009/03.1101.FA15Abstract
Abstrak
Lapisan tipis ZnO telah dideposisikan di atas substrat silikon menggunakan teknik ultrasonic spray pyrolisis (1.7 MHz). Suhu yang digunakan adalah 450°C (ZnO-A) dan 500°C (ZnO-B) dengan waktu deposisi 15 menit. Rata-rata ketebalan untuk ZnO-A adalah 150nm dan ZnO-B adalah 225nm. Analisis struktur kristal dilakukan menggunakan teknik difraksi sinar-x pada suhu ruang. Pola difrasi menunjukan bahwa kedua lapisan tipis memiliki struktur kristal polikristal dengan bentuk heksagonal wurtzite. Selanjutnya, akan dilakukan analisis struktur kristal menggunakan teknik penghalusan Rietveld secara sistematis dan komprehensif agar diperoleh data yang lebih presisi.
Kata-kata kunci: lapisan tipis ZnO, ultrasonik spray pyrolisis, struktur kristal, teknik penghalus Rietveld
Abstract
The ZnO thin film layer is deposited over the silicone substrate using ultrasonic spray pyrolysis technique (1.7 MHz). The operating temperature is at 450°C ( for ZnO-A) and 500°C ( for ZnO-B) with deposition time of 15 minutes. The thin film formed from each sample has got different thickness, wich is the average of 150 nm for ZnO-A and 225 nm fot ZnO-B. Next, crystal structure analysis is cerried out using x-ray diffraction method in romm temperature. The diffraction pattern shows that each of the thin layer has got polycrystal structure with the shape of wurtzite hexagonal. Eventually, crystal structure analysis is cerried out using Rietveld refinement systematically and comprehensively to obtain data with more precision.
Keywords ZnO thin film, ultrasonic spray pyrolysis technique, crystal structure, Rietveld refinement
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