ANALISIS STRUKTUR KRISTAL DAN ABSORBANSI LAPISAN TIPIS ZNO BERSTRUKTUR NANO DI ATAS SUBSTRAT KACA BERPELAPIS INDIUM TIN OXIDE

Nada Alfi Aliyah; Iwan Sugihartono; Rahmat Setiawan Mohar; Tan Swee Tiam; Akhmad Futukhillah Fataba Alaih; Djoko Triyono

doi:10.21009/03.1201.FA26

Nada Alfi Aliyah Program Studi Fisika, FMIPA Universitas Negeri Jakarta, Jl. Rawamangun Muka No. 01, Rawamangun 13220, Indonesia
Iwan Sugihartono Program Studi Fisika, FMIPA Universitas Negeri Jakarta, Jl. Rawamangun Muka No. 01, Rawamangun 13220, Indonesia
Rahmat Setiawan Mohar Center For Photonic National Research and Innovation Agency, Banten 15314, Indonesia
Tan Swee Tiam Xiamen University Malaysia, School of Energy and Chemical Engineering, 43900, Selangor Darul Ehsan, Malaysia
Akhmad Futukhillah Fataba Alaih Xiamen University Malaysia, School of Energy and Chemical Engineering, 43900, Selangor Darul Ehsan, Malaysia
Djoko Triyono Departemen Fisika, FMIPA UI, Kampus Baru UI Depok, Jawa Barat 16426, Indonesia

DOI: https://doi.org/10.21009/03.1201.FA26

Abstract

Abstrak

Pada penelitian ini telah dilakukan deposisi lapisan tipis ZnO berstruktur nano dengan menggunakan teknik Ultrasonic Spray Pyrolysis (USP) di atas substrat kaca Indium Tin Oxide (ITO) selama 15 menit pada suhu 450℃. Zinc Acetate Dyhydrate [Zn(CH₃COO)₂] digunakan sebagai prekursor Zn dengan variasi konsentrasi prekursor 0.1M dan 0.4M. Lapisan tipis ZnO telah dikarakterisasi menggunakan X-Ray Diffractometer (XRD), Uv-Vis Spectrofotometer, dan Scanning Electron Microscope (SEM) untuk menganalisis struktur kristal, absorbansi, dan struktur morfologi. Berdasarkan Inorganic Crystal Structure Database (ICSD) nomor #98-003-1060 dan #98-005-7478, pola X-Ray Diffraction (XRD) dari lapisan tipis ZnO memiliki struktur polikristal hexagonal wurtzite dengan space group P6₃mc. Uji Uv-Vis untuk sampel dengan konsentrasi 0.4M menunjukkan adanya peningkatan intensitas absorbansi paling dominan pada ~320 nm. Sehingga dapat diprediksikan sampel memiliki besar celah energi sebesar 3.2 eV.

Kata-kata kunci: lapisan tipis ZnO, ultrasonic spray pyrolysis, struktur kristal, absorbansi, celah energi.

Abstract

In this study, we have deposited nanostructured ZnO thin films using the Ultrasonic Spray Pyrolysis (USP) method on an Indium Tin Oxide (ITO) glass substrate for 15 minutes at 450℃. Zinc Acetate Dyhydrate [Zn(CH₃COO)₂] was used as a Zn precursor with various precursor concentrations of 0.1M and 0.4M. The ZnO thin film has been characterized using an X-Ray Diffractometer (XRD), Uv-Vis Spectrophotometer, and Scanning Electron Microscope (SEM) to obtain a crystal structure, absorbance, and morphology structure. Based on the Inorganic Crystal Structure Database (ICSD) number #98-003-1060 and #98-005-7478, the X-Ray Diffraction (XRD) pattern of ZnO thin film has a polycrystalline hexagonal wurtzite structure with space group P6₃mc. Uv-Vis characterization for samples with a concentration of 0.4M showed that there was an increase in absorbance intensity that was most dominant at ~320 nm. Hence, it can be predicted that the sample has an energy gap of 3.2 eV.

Keywords: ZnO thin film, ultrasonic spray pyrolysis, crystal structure, absorbance, bandgap.

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