KARAKTERISASI MORFOLOGI DAN KOMPOSISI LAPISAN KOMPOSIT NI-TIN-ALN/SI3N4 DENGAN METODE ELEKTRODEPOSISI RAPAT ARUS PULSA

Alayya Binta Maulida; Esmar Budi; Teguh Budi Prayitno

doi:10.21009/03.1201.FA29

Alayya Binta Maulida Program Studi Fisika, Fakultas Matematika dan Ilmu Pengetahuan Alam, Universitas Negeri Jakarta, Jl. Rawamangun Muka, Jakarta 13220, Indonesia
Esmar Budi Program Studi Fisika, Fakultas Matematika dan Ilmu Pengetahuan Alam, Universitas Negeri Jakarta, Jl. Rawamangun Muka, Jakarta 13220, Indonesia
Teguh Budi Prayitno Program Studi Fisika, Fakultas Matematika dan Ilmu Pengetahuan Alam, Universitas Negeri Jakarta, Jl. Rawamangun Muka, Jakarta 13220, Indonesia

DOI: https://doi.org/10.21009/03.1201.FA29

Abstract

Abstrak

Pelapisan logam banyak dilakukan oleh industrialis untuk menyesuaikan morfologi permukaan, kinerja keausan, daya rekat dan kekuatan bahan substrat tanpa mengubah sifat asli substrat. Pembentukan lapisan komposit Ni-TiN-AlN/Si₃N₄ pada Tungsten Karbida (WC) telah dilakukan untuk menganalisis pengaruh rapat arus pulsa sebesar 0,4 mA/mm² terhadap morfologi, komposisi, dan tebal lapisan komposit Ni-TiN-AlN/Si₃N₄. Pelapisan menggunakan metode elektrodeposisi pada suhu 40ºC dengan laju pengadukan 600 rpm selama 30 menit. Komposisi yang digunakan adalah NiCl₂.6H₂O 0,17 M, Ni₂SO₄.6H₂O 0,38 M, TiN 6 g/L, AlN 6 g/L, Si₃N₄0,6 g/L, H₃BO₃ 0,49 M dan SDS (Sodium Dodecyl Sulfate) 0,6 g/L. Hasil penelitian menunjukkan adanya kandungan unsur logam Ni, Ti, Al, serta Si dengan tebal lapisan komposit yang terbentuk yaitu 1,121 μm. Pemindaian morfologi menunjukkan permukaan yang kasar serta terjadinya aglomerasi pada permukaan substrat.

Kata-kata kunci: lapisan komposit Ni-TiN-AlN/Si₃N₄, elektrodeposisi, rapat arus pulsa, morfologi permukaan.

Abstract

Metal coatings are widely used by industrialists to adjust the surface morphology, wear performance, adhesion and strength of the substrate material without changing the original properties of the substrate. The formation of the Ni-TiN-AlN/Si₃N₄composite layer on Tungsten Carbide (WC) was carried out to analyze the effect of the pulse current density of 0,4 mA/mm²on the morphology, composition, and thickness of the Ni-TiN-AlN/Si₃N₄composite layer. The coating was deposited using the electrodeposition technique at 40ºC with a stirring rate of 600 rpm for 30 minutes. The compositions used NiCl₂.6H₂O 0,17 M, Ni₂SO₄.6H₂O 0,38 M, TiN 6 g/L, AlN 6 g/L, Si₃N₄0,6 g/L, H₃BO₃ 0,49 M and SDS (Sodium Dodecyl Sulfat) 0,6 g/L. The results showed the presence of metal elements Ni, Ti, Al, and Si with the thickness of the composite layer formed was 1.121 μm. Morphological scanning showed a rough surface as well as agglomeration on the surface of the substrate.

Keywords: Ni-TiN-AlN/Si₃N₄ composite layer, electrodeposition, pulse current density, surface morphology.

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